Patent · US Active

Illumination system of a microlithographic projection exposure apparatus with a birefringent element

US9316920B2 · kind B2 · utility

0Cited by

7References

27Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Damian Fiolka · Oberkochen, DE
Daniel Walldorf · Frankfurt, DE
Ingo Saenger · Heidenheim, DE

Key dates

Filing date	Mar 4, 2010
Grant date	Apr 19, 2016
Priority date	—
Expiry date	Apr 4, 2033

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70966
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The disclosure concerns an illumination system of a microlithographic projection exposure apparatus. The illumination system includes a mirror arrangement which has a plurality of mirror units and at least one element arranged in front of the mirror arrangement in the light propagation direction to produce at least two different states of polarization incident on different mirror units. The mirror units are displaceable independently of each other for altering an angle distribution of the light reflected by the mirror arrangement.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.