Gate structure and method for trimming spacers
US9318571B2 · kind B2 · utility
3Cited by
14References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 23, 2009 |
| Grant date | Apr 19, 2016 |
| Priority date | — |
| Expiry date | Feb 3, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D64/021
Abstract
A gate structure includes a gate disposed on a substrate, a first spacer disposed on the substrate and surrounding the gate and a second spacer disposed on the first spacer and surrounding the gate, the second spacer is lower than the first spacer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.