Patent · US Active

Optical system of a microlithographic projection exposure apparatus

US9323156B2 · kind B2 · utility

0Cited by

3References

23Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Ingo Saenger · Heidenheim, DE
Olaf Dittmann · Bopfingen, DE
Joerg Zimmermann · Vancouver, CA

Key dates

Filing date	Oct 26, 2012
Grant date	Apr 26, 2016
Priority date	—
Expiry date	Sep 10, 2034

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70566
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An optical system of a microlithographic projection exposure apparatus includes at least one mirror arrangement having a plurality of mirror elements which are displaceable independently of each other for altering an angular distribution of the light reflected by the mirror arrangement. The optical system also includes a polarization-influencing optical arrangement including a first lambda/2 plate and at least one additional lambda/2 plate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.