Olaf Dittmann
14Patents
3h-index
38Co-inventors
56Inventor score
Filing activity: Sep 22, 2005 → Jun 23, 2015
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7728975B1 | Method for describing, evaluating and improving optical polarization properties of a microlithographic projection exposure apparatus | Physics | 5 | Active |
| US7982854B2 | Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system | Physics | 4 | Active |
| US8264668B2 | Illumination system of a microlithographic projection exposure apparatus | Physics | 4 | Active |
| US8928859B2 | Illumination system of a microlithographic projection exposure apparatus | Physics | 2 | Active |
| US7961297B2 | Method for determining intensity distribution in the image plane of a projection exposure arrangement | Physics | 1 | Active |
| US7808615B2 | Projection exposure apparatus and method for operating the same | Physics | 1 | Active |
| US9170499B2 | Illumination system of a microlithographic projection exposure apparatus comprising a depolarizing element | Physics | 1 | Active |
| US7982969B2 | Projection objective of a microlithographic projection exposure apparatus | Physics | 1 | Active |
| US8854606B2 | Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system | Physics | 1 | Active |
| US9946161B2 | Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method | Physics | 1 | Active |
| US7474469B2 | Arrangement of optical elements in a microlithographic projection exposure apparatus | Physics | 0 | Expired |
| US9581910B2 | Method of lithographically transferring a pattern on a light sensitive surface and illumination system of a microlithographic projection exposure apparatus | Physics | 0 | Active |
| US9323156B2 | Optical system of a microlithographic projection exposure apparatus | Physics | 0 | Active |
| US8325426B2 | Projection objective of a microlithographic projection exposure apparatus | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.