Plasma treatment device
US9333460B2 · kind B2 · utility
7Cited by
14References
7Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 21, 2006 |
| Grant date | May 10, 2016 |
| Priority date | — |
| Expiry date | Aug 25, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H2245/15
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A plasma abatement device comprises a gas chamber having a gas inlet for receiving a gas to be treated by the device and a gas outlet, at least part of the inner surface of the gas chamber being formed from, or coated with, an electrically conductive material that is resistant to corrosion during treatment of a gas containing a halocompound and water vapor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.