Patent · US Active

Substrate spreading device for vacuum processing apparatus, vacuum processing apparatus with substrate spreading device and method for operating same

US9333525B2 · kind B2 · utility

2Cited by

4References

16Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Florian RIES · Stuttgart, DE
Andreas Sauer · Großostheim, DE
Stefan Hein · Berlin, DE

Key dates

Filing date	Jan 21, 2014
Grant date	May 10, 2016
Priority date	—
Expiry date	Jan 21, 2034

Classification

Technology area (CPC G)Physics
CPC primaryG11B5/85
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A processing apparatus for processing a flexible substrate, particularly a vacuum processing apparatus for processing a flexible substrate, is described. The processing apparatus includes a vacuum chamber; a processing drum within the vacuum chamber, wherein the processing drum is configured to rotate around an axis extending in a first direction; and a heating device adjacent to the processing drum, wherein the heating device is configured for spreading the substrate in the first direction or for maintaining a spread of the substrate in the first direction, and wherein the heating device has a dimension in a direction parallel to a substrate transport direction of at least 20 mm.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.