Patent · US Active

Processing liquid for suppressing pattern collapse of fine metal structure and method for producing fine metal structure using same

US9334161B2 · kind B2 · utility

0Cited by
12References
14Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 29, 2010
Grant dateMay 10, 2016
Priority date
Expiry dateOct 12, 2030

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/02057
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

There are provided a processing liquid for suppressing pattern collapse of a fine metal structure, containing at least one member selected from an imidazolium halide having an alkyl group containing 12, 14 or 16 carbon atoms, a pyridinium halide having an alkyl group containing 14 or 16 carbon atoms, an ammonium halide having an alkyl group containing 14, 16 or 18 carbon atoms, a betaine compound having an alkyl group containing 12, 14 or 16 carbon atoms, and an amine oxide compound having an alkyl group containing 14, 16 or 18 carbon atoms, and a method for producing a fine metal structure using the same.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.