Self-assembly of block copolymers on topographically patterned polymeric substrates
US9335629B2 · kind B2 · utility
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Key dates
| Filing date | Jul 11, 2012 |
| Grant date | May 10, 2016 |
| Priority date | — |
| Expiry date | Apr 1, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/249953
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Highly-ordered block copolymer films are prepared by a method that includes forming a polymeric replica of a topographically patterned crystalline surface, forming a block copolymer film on the topographically patterned surface of the polymeric replica, and annealing the block copolymer film. The resulting structures can be used in a variety of different applications, including the fabrication of high density data storage media. The ability to use flexible polymers to form the polymeric replica facilitates industrial-scale processes utilizing the highly-ordered block copolymer films.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.