Laser-produced plasma EUV source with reduced debris generation utilizing predetermined non-thermal laser ablation
US9335637B2 · kind B2 · utility
1Cited by
6References
18Claims
0Family size
Assignee
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Key dates
| Filing date | Sep 8, 2011 |
| Grant date | May 10, 2016 |
| Priority date | — |
| Expiry date | Dec 19, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0094
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A method and apparatus for generating extreme ultraviolet (EUV) light is disclosed. The method may comprise non-thermally ablating a target material utilizing a first laser beam. The first laser beam may be configured for ejecting a portion of the target material in a non-thermal manner to create a plume. The method may further comprise irradiating the plume utilizing a second laser beam to produce a high-temperature plasma for EUV radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.