Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, registration, and overlay techniques

US9341961B2 · kind B2 · utility

Assignee

• GlobalFoundries Singapore Pte. Ltd. · SG

Inventors

• Guo Xiang Ning · Ballston Lake, US
• Arthur Hotzel · Dresden, DE
• Paul Ackmann · Gansevoort, US
• Soon Yoeng Tan · Skudai, MY

Key dates

• Filing date: Mar 15, 2013
• Grant date: May 17, 2016
• Expiry date: Mar 14, 2034

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F1/50
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Methods for reducing reticle transmission differences and for optimizing layer placement for overlay in MTRs and CTRs are disclosed. Embodiments include providing a reticle having a prime area and a frame area surrounding the prime area; determining RT differences across the prime area; and providing RT adjustment structures on the reticle to decrease the RT differences. Other embodiments include grouping multiple layers of a semiconductor production flow, the layers for each group having an RT difference less than a predetermined value; and placing the layers on plural ordered reticles of a reticle set, each reticle having multiple image fields, by selecting, for each reticle, layers from a single group and optimizing placement of the layers for overlay. Other embodiments include selectively rotating image fields on a reticle having multiple image fields to improve overlay, or optimizing placement of DDLs on CTRs by placing each design orientation on a different reticle.