Patent · US Active

GCIB nozzle assembly

US9343259B2 · kind B2 · utility

0Cited by
1References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 31, 2015
Grant dateMay 17, 2016
Priority date
Expiry dateJul 31, 2035

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2237/3151
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A nozzle assembly used for performing gas cluster ion beam (GCIB) etch processing of various materials is described. In particular, the nozzle assembly includes two or more conical nozzles that are aligned such that they are both used to generate the same GCIB. The first conical nozzle may include the throat that initially forms the GCIB and the second nozzle may form a larger conical cavity that may be appended to the first conical nozzle. A transition region may be disposed between the two conical nozzles that may substantially cylindrical and slightly larger than the largest diameter of the first conical nozzle.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.