Patent · US Active

Coating substrates with an alloy by means of cathode sputtering

US9347131B2 · kind B2 · utility

12Cited by

9References

10Claims

0Family size

Assignee

SINGULUS TECHNOLOGIES AG · DE

Inventors

Wolfram Maass · Gelnhausen, DE
Berthold Ocker · Hanau, DE
Jürgen Langer · Offenbach, DE

Key dates

Filing date	Sep 28, 2011
Grant date	May 24, 2016
Priority date	—
Expiry date	Sep 28, 2031

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3429
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

The invention relates to a target for coating a substrate with an alloy by means of cathode sputtering, said alloy having at least one first material and one second material as alloy components. The surface of the target has at least one first section made of the first material and one second section made of the second material. The two sections adjoin each other and form a common boundary line. The invention further relates to a device and a method for coating a substrate with an alloy by means of cathode sputtering using the target according to the invention.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.