Compact ampoule thermal management system
US9347696B2 · kind B2 · utility
1Cited by
2References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 24, 2013 |
| Grant date | May 24, 2016 |
| Priority date | — |
| Expiry date | Feb 26, 2034 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4482
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Apparatus for thermal management of a precursor for use in substrate processing are provided herein. In some embodiments, an apparatus for thermal management of a precursor for use in substrate processing may include a body having an opening sized to receive a storage container having a liquid or solid precursor disposed therein, the body fabricated from thermally conductive material; one or more thermoelectric devices coupled to the body proximate the opening; and a heat sink coupled to the one or more thermoelectric devices.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.