Photoacid generators and photoresists comprising same

US9348220B2 · kind B2 · utility

Assignee

• Rohm and Haas Electronic Materials LLC · US

Inventors

• Emad Aqad · Northborough, US
• Mingqi Li · Sammamish, US
• Cheng-Bai Xu · Upton, US
• Cong Liu · Lanzhou, CN

Key dates

• Filing date: Mar 31, 2011
• Grant date: May 24, 2016
• Expiry date: Mar 31, 2031

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/0395
• WIPO field: Organic fine chemistry
• WIPO sector: Chemistry

Abstract

New methods are provided for synthesis of photoacid generator compounds (“PAGs”), new photoacid generator compounds and photoresist compositions that comprise such PAG compounds. In a particular aspect, photoacid generators that comprise 1) a SO3− moiety; 2) one or more fluorinated carbons; and 3) one or more of the fluorinated carbons either directly or indirectly substituted by an ester keto group.