Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method
US9348238B2 · kind B2 · utility
1Cited by
36References
38Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 12, 2013 |
| Grant date | May 24, 2016 |
| Priority date | — |
| Expiry date | May 17, 2034 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49002
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus exposes an object with an exposure beam. The apparatus includes first and second stages, a measurement device and a controller. The first stage mounts the object. The second stage is movable relative to the first stage. The measurement device obtains position information of an outer periphery edge of the first stage. The controller controls at least one of a position of the first stage and a position of the second stage based on the position information of the outer periphery edge so that the first and second stages do not touch each other.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.