Cascade design showerhead for transient uniformity
US9353439B2 · kind B2 · utility
6Cited by
80References
35Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 5, 2013 |
| Grant date | May 31, 2016 |
| Priority date | — |
| Expiry date | Feb 5, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32633
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus for use in semiconductor processing operations to distribute process gases across a semiconductor wafer. The apparatus may include one or more annular baffles arranged in a stack of annular baffle layers within a plenum volume of the apparatus. Each annular baffle may have a mid-diameter substantially equal to and inner diameter or outer diameter of a baffle in the annular baffle layer above it. The annular baffles may be arranged in a cascading fashion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.