Monomer for hardmask composition, hardmask composition including monomer, and pattern forming method using hardmask composition
US9359276B2 · kind B2 · utility
1Cited by
1References
10Claims
0Family size
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Key dates
| Filing date | Nov 21, 2012 |
| Grant date | Jun 7, 2016 |
| Priority date | — |
| Expiry date | Nov 21, 2032 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07C2603/54
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed are a monomer for a hardmask composition represented by the Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.