Cleaning liquid for semiconductor device substrates and method of cleaning substrate for semiconductor devices
US9365802B2 · kind B2 · utility
1Cited by
1References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 28, 2013 |
| Grant date | Jun 14, 2016 |
| Priority date | — |
| Expiry date | Sep 13, 2034 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The invention relates to a cleaning liquid for semiconductor device substrates comprising the following components (A) to (D) and a method of cleaning semiconductor device substrates:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.