Method for depositing film
US9365920B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 24, 2009 |
| Grant date | Jun 14, 2016 |
| Priority date | — |
| Expiry date | Oct 7, 2029 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2217/77
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The method for depositing a film of the present invention comprises the first irradiation step of irradiating particles having energy on a surface of a substrate 101, the first film deposition step of depositing a first film 103 on the surface of the substrate 101 subjected to the first irradiation step by using a dry process, and the second film deposition step of depositing a second film 105 having oil repellency on a surface of the first film 103. According to the present invention, a method for depositing a film enabling production of an oil-repellent substrate comprising an oil-repellent film having abrasion resistance of a practically sufficient level can be provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.