Apparatus and method for defect detection including patch-to-patch comparisons
US9367911B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 13, 2012 |
| Grant date | Jun 14, 2016 |
| Priority date | — |
| Expiry date | Oct 16, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A system receives, based on processing of an inspected frame of an inspected image generated by collecting signals indicative of a pattern on an article, at least one candidate defect location in the inspected frame. The system defines a candidate patch within the inspected frame. The candidate patch is associated with the candidate defect location. The system identifies at least one similar patch in the inspected frame using a predefined similarity criterion and determines whether a defect exists at the candidate defect location based on a comparison of at least a portion of the candidate patch with at least a corresponding portion of the at least one similar patch.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.