Hardmask composition and method of forming patterns using the hardmask composition
US9371444B2 · kind B2 · utility
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3References
14Claims
0Family size
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Key dates
| Filing date | Jan 22, 2015 |
| Grant date | Jun 21, 2016 |
| Priority date | — |
| Expiry date | Jan 22, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08G2261/45
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A hardmask composition and a method of forming patterns, the composition including a solvent; and a polymer including a moiety represented by the following Chemical Formula 1,
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.