Ion source, ion gun, and analysis instrument
US9372161B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 20, 2015 |
| Grant date | Jun 21, 2016 |
| Priority date | — |
| Expiry date | Jan 20, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3174
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Provided are an ion source, an ion gun, and an analysis instrument, which are capable of performing sputtering without damage to a surface of a sample and improving detection sensitivity in mass spectroscopy. In the ion source, an emission opening to which ionization liquid is supplied is disposed in an electric field formed in vacuum environment by an extracting electrode so that super large droplet cluster ions are generated from the emission opening. When the sample is irradiated with a super large droplet cluster ion beam, the sample surface is subjected to sputtering without damage, so as to remove contamination substances or to expose a new surface of the sample. In mass spectroscopy, detection sensitivity is improved.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.