Patterning in the directed assembly of block copolymers using triblock or multiblock copolymers
US9372398B2 · kind B2 · utility
3Cited by
20References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 6, 2012 |
| Grant date | Jun 21, 2016 |
| Priority date | — |
| Expiry date | Nov 28, 2034 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24851
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Provided herein are block copolymer thin film structures and methods of fabrication. The methods involve directing the assembly of ABA triblock copolymers such that desired features are formed by domains of the assembled ABA triblock copolymer. In some embodiments, an ABA triblock copolymer is directed to assemble by a chemical pattern. Chemical patterns with periods much different than the natural period of the ABA triblock copolymer may be used to direct assembly of the ABA triblock copolymer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.