Reflective mask blank and method for manufacturing same, method for manufacturing reflective mask, and method for manufacturing semiconductor device
US9377679B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 27, 2013 |
| Grant date | Jun 28, 2016 |
| Priority date | — |
| Expiry date | Jul 27, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/48
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
This invention provides a reflective mask blank capable of preventing peeling-off of a multilayer reflective film due to cleaning or the like in a mask manufacturing process or during mask use. The reflective mask blank includes a multilayer reflective film, a protective film, an absorber film, and a resist film formed in this order on a substrate. Assuming that a distance from the center of the substrate to an outer peripheral end of the multilayer reflective film is L(ML), that a distance from the center of the substrate to an outer peripheral end of the protective film is L(Cap), that a distance from the center of the substrate to an outer peripheral end of the absorber film is L(Abs), and that a distance from the center of the substrate to an outer peripheral end of the resist film is L(Res), L(Abs)>L(Res)>L(Cap)≧L(ML) and the outer peripheral end of the resist film is located inward of an outer peripheral end of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.