Collector in an extreme ultraviolet lithography system with optimal air curtain protection
US9377693B2 · kind B2 · utility
10Cited by
0References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 13, 2014 |
| Grant date | Jun 28, 2016 |
| Priority date | — |
| Expiry date | Sep 3, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/009
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
The present disclosure provides an extreme ultraviolet (EUV) radiation source module. The EUV radiation source module includes a collector designed to collect and reflect EUV light; a solid cover integrated with the collector and configured to have a supply gap between the collector and the solid cover; and a gas pipeline integrated with the collector. The supply gap provides a path for gas flow to the radiation source at edge of the collector. The gas pipeline includes an inward entrance and an outward entrance.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.