Substrate processing apparatus and substrate processing method
US9378991B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 11, 2009 |
| Grant date | Jun 28, 2016 |
| Priority date | — |
| Expiry date | Nov 9, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67703
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate processing apparatus includes a transport chamber and a processing chamber that processes substrates. The transport chamber has a first substrate transport member transporting the substrates from the transport chamber to the processing chamber. The processing chamber has a first processing unit which is adjacent to the transport chamber and has a first substrate placing base, a second processing unit which is adjacent to the other side of the transport chamber in the first processing unit and has a second substrate placing base, a second substrate transport member transporting the substrates between the first processing unit and the second processing unit, and a control unit controlling at least the second substrate transport member.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.