Patent · US Active

Aligning and focusing an electron beam in an X-ray source

US9380690B2 · kind B2 · utility

4Cited by

4References

24Claims

0Family size

Assignee

Excillum AB · SE

Inventors

Oscar Hemberg · Village of La Jolla, US
Tomi Tuohimaa · Sollentuna, SE
Björn Sundman · Sollentuna, SE

Key dates

Filing date	Dec 21, 2011
Grant date	Jun 28, 2016
Priority date	—
Expiry date	Nov 14, 2032

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2235/082
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A technique for indirectly measuring the degree of alignment of a beam in an electron-optical system including aligning means, focusing means and deflection means. To carry out the measurements, a simple sensor may be used, even a single-element sensor, provided it has a well-defined spatial extent. When practiced in connection with an X-ray source which is operable to produce an X-ray target, further, a technique for determining and controlling a width of an electron-beam at its intersection point with the target.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.