Patent · US Active

Adaptive laser system for an extreme ultraviolet light source

US9380691B2 · kind B2 · utility

4Cited by

1References

20Claims

0Family size

Assignee

ASML NETHERLANDS B.V. · NL

Inventors

Yezheng Tao · San Diego, US
Daniel John William Brown · Woodbury, US
Alexander Anthony Schafgans · San Diego, US
Michael David Caudill · San Diego, US
Daniel J. Golich · San Diego, US
Richard L. Sandstrom · Encinitas, US
Yoshiho Amada · Hiratsuka, JP

Key dates

Filing date	Feb 28, 2014
Grant date	Jun 28, 2016
Priority date	—
Expiry date	Jul 10, 2034

Classification

Technology area (CPC H)Electricity
CPC primaryH01S3/2316
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A system for an extreme ultraviolet (EUV) light source includes an optical amplifier including a gain medium positioned on a beam path, the optical amplifier configured to receive a light beam at an input and to emit an output light beam for an EUV light source at an output; a feedback system that measures a property of the output light beam and produces a feedback signal based on the measured property; and an adaptive optic positioned in the beam path and configured to receive the feedback signal and to adjust a property of the output light beam in response to the feedback signal.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.