Epitaxial lift off systems and methods
US9381731B2 · kind B2 · utility
2Cited by
7References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 19, 2014 |
| Grant date | Jul 5, 2016 |
| Priority date | — |
| Expiry date | Aug 2, 2034 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T156/15
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Epitaxial lift off systems and methods are presented. In one embodiment a tape is disposed on the opposite side of the epitaxial material than the substrate is used to hold the epitaxial material during the etching and removal steps of the ELO process. In various embodiments, the apparatus for removing the ELO film from the substrates without damaging the ELO film may include an etchant reservoir, substrate handling and tape handling mechanisms, including mechanisms to manipulate (e.g., cause tension, peel, widen the etch gap, etc.) the lift off component during the lift off process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.