Lithography apparatus
US9383328B2 · kind B2 · utility
1Cited by
1References
20Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Aug 15, 2013 |
| Grant date | Jul 5, 2016 |
| Priority date | — |
| Expiry date | Sep 19, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70858
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A lithography apparatus comprises a structural element, a sensor having a detection region for detecting a physical quantity in at least one detection direction with respect to the structural element, and a sensor receptacle for mounting the sensor to the structural element, wherein the sensor is arranged in such a way that the maximum displacement of the detection region in the detection direction relative to the structural element is not greater than the maximum displacement of the detection region in the detection direction in the case of an arrangement of the sensor orthogonally with respect thereto.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.