Optical element, illumination device, measurement apparatus, photomask, exposure method, and device manufacturing method
US9389345B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Sep 18, 2013 |
| Grant date | Jul 12, 2016 |
| Priority date | — |
| Expiry date | Nov 27, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/706
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An optical element includes: an incident surface irradiated with irradiation light; an emission surface of which at least a part faces a direction opposite to the incident surface; and a metal film having a hole to connect the incident surface and emission surface. The incident surface includes a first surface, disposed around an end of the hole on the incident surface side and having an inner edge connected to an inner surface of the hole, and a second surface disposed around the first surface forming a discontinuous portion between the second surface and an outer edge of the first surface. The distance between the inner and outer edges is determined by a wavelength of surface plasmons such that an intensity of light is increased due to interference between surface plasmons, excited at the inner edge by the irradiation light, and surface plasmons traveling from the discontinuous portion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.