Apparatus and method for cleaning photomask
US9400425B2 · kind B2 · utility
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1References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 17, 2014 |
| Grant date | Jul 26, 2016 |
| Priority date | — |
| Expiry date | Feb 3, 2035 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B7/0042
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
This invention relates to an apparatus and method for cleaning a photomask. This apparatus, suitable for use in removing an adhesive residue from a photomask, includes a photomask disposed such that a surface thereof on which an adhesive residue is left behind is directed downwards, a metal plate formed adjacent to the adhesive residue, and a laser generator for irradiating a laser onto the metal plate so that the adhesive residue is removed by heat generated from the metal plate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.