Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, mask blank and method of forming pattern
US9400430B2 · kind B2 · utility
2Cited by
9References
23Claims
0Family size
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Key dates
| Filing date | May 9, 2014 |
| Grant date | Jul 26, 2016 |
| Priority date | — |
| Expiry date | May 9, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2002
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a compound (A) that contains a structure (P) containing at least one phenolic hydroxyl group and a structure (Q) containing at least one phenolic hydroxyl group whose hydrogen atom is replaced by a group (S) with a cyclic structure containing an acid crosslinking group, characterized in that the group (S) with a cyclic structure containing an acid crosslinking group is a group with a polycyclic structure or a group with a cyclic structure containing a hydroxymethyl group and/or an alkoxymethyl group.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.