Detection device, exposure apparatus, and device manufacturing method using same
US9400436B2 · kind B2 · utility
2Cited by
8References
14Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 16, 2013 |
| Grant date | Jul 26, 2016 |
| Priority date | — |
| Expiry date | Jun 20, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7088
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A detection device that detects a mark provided on the back side of an object, the detection device includes a first detection unit configured to detect the mark from a surface side of the object; a second detection unit configured to detect a surface position of the object; and a processing unit. The processing unit determines a thickness of the object based on a difference between a first focus position acquired with reference to the position of the mark detected by the first detection unit and a second focus position acquired with reference to the surface position detected by the second detection unit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.