Inductive structure formed using through silicon vias
US9406738B2 · kind B2 · utility
12Cited by
35References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 20, 2011 |
| Grant date | Aug 2, 2016 |
| Priority date | — |
| Expiry date | Feb 4, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/15311
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An inductor for an integrated circuit can include a first turn comprising a first through silicon via (TSV) coupled to a second TSV. The inductor can include a third TSV coupled to the second TSV.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.