Methods and apparatus for spectral luminescence measurement
US9410890B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Mar 12, 2013 |
| Grant date | Aug 9, 2016 |
| Priority date | — |
| Expiry date | Jun 13, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/66
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
One embodiment relates to a computer-implemented method of processing spectral luminescence mapping data obtained from a substrate, the substrate having an epitaxial layer stack that includes a multiple quantum well. A spectral luminescence and an epi thickness at a location on the substrate are obtained. A spectral modulation for the location may be computed given the epi thickness and material indices of refraction. The underlying luminescence spectrum may then be generated by dividing the measured spectral luminescence by the spectral modulation. Subsequently, a peak wavelength and other parameters may be obtained from the underlying luminescence spectrum. In another embodiment, the underlying luminescence spectrum may be determined, without the epi thickness measurement, using a self-consistent technique. Another embodiment relates to an apparatus for spectral luminescence mapping and epitaxial thickness measurement. Other embodiments, aspects and features are also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.