Coating agent for forming fine pattern
US9417532B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 25, 2015 |
| Grant date | Aug 16, 2016 |
| Priority date | — |
| Expiry date | Apr 4, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/327
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A coating agent for forming a fine pattern capable of simultaneously achieving slimming and roughness reduction of a positive-type resist pattern without deteriorating the cross-sectional shape of the slimmed positive type resist pattern and a method of slimming treatment of a positive-type resist pattern using the above coating agent for forming a fine pattern. A coating agent comprising a nitrogen-containing compound with a specific structure and an organic solvent is used as the coating agent for forming fine pattern used for a positive-type resist pattern. The coating agent may include a basic nitrogen-containing compound and/or a water-soluble polymer or an alkali-soluble polymer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.