System and methods for spin-on coating of self-assembled monolayers or periodic organosilicates on a substrate
US9418834B2 · kind B2 · utility
3Cited by
4References
20Claims
0Family size
Assignee
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Key dates
| Filing date | Dec 15, 2014 |
| Grant date | Aug 16, 2016 |
| Priority date | — |
| Expiry date | Dec 15, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/3105
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
This disclosure relates to a processing system for spin-coating a substrate with Molecular Self-assembly (MSA) chemicals to form photoresist films and/or low dielectric constant (low-k) films on the substrate. The spin-coating processing system may include a spin-coating chamber that can receive and spin-coat MSA chemicals onto the substrate and an annealing chamber to thermally treat the substrate after the spin-coat process. In certain embodiments, the spin-coating processing system may also pre-treat or pre-wet the substrate prior to the spin-coating process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.