Method of generating patterns on doubly-curved surfaces
US9427909B2 · kind B2 · utility
1Cited by
13References
20Claims
0Family size
Assignee
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Key dates
| Filing date | Mar 17, 2014 |
| Grant date | Aug 30, 2016 |
| Priority date | — |
| Expiry date | Feb 17, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/24
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
Disclosed is a system and method for patterning internal and/or external doubly-curved surfaces by use of a light source, three-dimensional scanning optics, computer controller, and a multi-axis robot. The system is capable of digitally receiving shape, location, and pattern data of a three-dimensional doubly-curved surface and applying said pattern over large areas with high precision in a seamless fashion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.