Plasma generation for thin film deposition on flexible substrates
US9435028B2 · kind B2 · utility
1Cited by
13References
18Claims
0Family size
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Key dates
| Filing date | May 6, 2013 |
| Grant date | Sep 6, 2016 |
| Priority date | — |
| Expiry date | Mar 7, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3277
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A system for depositing a thin film on a flexible substrate comprises a plurality of processing zones spaced apart by an isolation zone, a plasma generator for generating a plasma region proximal to a pathway along which the substrate travels, and a substrate transport mechanism for guiding the substrate back and forth between the processing zones so that the substrate is transported past and exposed to the plasma region when the system is in use.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.