Automated plasma cleaning system
US9435742B2 · kind B2 · utility
4Cited by
12References
21Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 21, 2013 |
| Grant date | Sep 6, 2016 |
| Priority date | — |
| Expiry date | Jun 17, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2201/0221
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An analysis (e.g., LIBS) system includes a laser source generating a laser beam for creating a plasma at a location on a sample, and a spectrometer responsive to photons emitted by the sample at said location and having an output. A controller is responsive to a trigger signal and is configured to activate the laser source generating a series of laser pulses in a cleaning cycle, process the spectrometer output, and automatically terminate the cleaning cycle based on the spectrometer output.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.