Patent · US Active

Optical arrangement and microlithographic projection exposure apparatus including same

US9436101B2 · kind B2 · utility

2Cited by

14References

27Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Armin Schoeppach · Aalen, DE
Hans-Juergen Mann · Oberkochen, DE
Frank Eisert · Aalen, DE
Yim-Bun Patrick Kwan · Aalen, DE

Key dates

Filing date	Feb 28, 2012
Grant date	Sep 6, 2016
Priority date	—
Expiry date	Jan 10, 2034

Classification

Technology area (CPC G)Physics
CPC primaryG02B17/0657
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An optical arrangement includes at least one optical element and a support element for the optical element. The optical element and the support element are connected together by way of at least three decoupling elements. The decoupling elements are formed monolithically with the optical element and with the support element.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.