Patent · US Active

Insulated dielectric window assembly of an inductively coupled plasma processing apparatus

US9437400B2 · kind B2 · utility

1Cited by
13References
24Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 2, 2012
Grant dateSep 6, 2016
Priority date
Expiry dateNov 19, 2034

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T29/49826
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

An insulated dielectric window assembly comprising a dielectric window of an inductively coupled plasma processing apparatus; an upper polymeric ring, and a lower polymeric ring. The upper polymeric ring insulates the outer edge of the dielectric window from a cooler ambient atmosphere and the lower polymeric ring insulates the lower surface of the dielectric window from a chamber surface supporting the window.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.