Insulated dielectric window assembly of an inductively coupled plasma processing apparatus
US9437400B2 · kind B2 · utility
1Cited by
13References
24Claims
0Family size
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Key dates
| Filing date | May 2, 2012 |
| Grant date | Sep 6, 2016 |
| Priority date | — |
| Expiry date | Nov 19, 2034 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49826
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An insulated dielectric window assembly comprising a dielectric window of an inductively coupled plasma processing apparatus; an upper polymeric ring, and a lower polymeric ring. The upper polymeric ring insulates the outer edge of the dielectric window from a cooler ambient atmosphere and the lower polymeric ring insulates the lower surface of the dielectric window from a chamber surface supporting the window.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.