Method for manufacturing a micromechanical system comprising a removal of sacrificial material through a hole in a margin region

US9452923B2 · kind B2 · utility

Assignee

• Infineon Technologies Dresden GmbH & Co. KG · DE

Inventors

• Thoralf Kautzsch · Dresden, DE
• Heiko Froehlich · Radebeul, DE
• Mirko Vogt · Dresden, DE
• Maik Stegemann · Freital, DE

Key dates

• Filing date: Dec 20, 2012
• Grant date: Sep 27, 2016
• Expiry date: Jun 19, 2034

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B81C2203/0145
• WIPO field: Micro-structural and nano-technology
• WIPO sector: Chemistry

Abstract

A method for manufacturing a micromechanical system includes creating a sacrificial layer at a substrate surface. A structural material is deposited at a sacrificial layer surface and at a support structure for later supporting the structural material. At least one hole is created in the structural material extending from an exposed surface of the structural material to the surface of the sacrificial layer. The at least one hole leads to a margin region of the sacrificial layer. The sacrificial layer is removed using a removal process through the at least one hole, to obtain a cavity between the surface of the substrate and the structural material. The method also includes filling the at least one hole and a portion of the cavity beneath the at least one hole close to the cavity. A corresponding micromechanical system and a microelectromechanical transducer are also described.