Lithographic apparatus and device manufacturing method
US9457947B2 · kind B2 · utility
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33Claims
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Key dates
| Filing date | Oct 12, 2012 |
| Grant date | Oct 4, 2016 |
| Priority date | — |
| Expiry date | Oct 19, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67359
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An apparatus and a method to hold a patterning device configured to impart a beam of radiation with a pattern in its cross-section. The apparatus includes a base configured to support the patterning device and an inner cover couplable to the base. The inner cover includes a restraining mechanism that, upon an application of a force external to the inner cover, is configured to provide an in-plane force to the patterning device to restrain movement of the patterning device, the in-plane force being substantially parallel to a patterning surface of the patterning device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.