Photoresist overcoat compositions and methods of forming electronic devices
US9458348B2 · kind B2 · utility
2Cited by
10References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 11, 2015 |
| Grant date | Oct 4, 2016 |
| Priority date | — |
| Expiry date | Nov 11, 2035 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/12
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Provided are photoresist overcoat compositions, substrates coated with the overcoat compositions and methods of forming electronic devices by a negative tone development process. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.