Additives for orientation control of block copolymers
US9458353B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 15, 2015 |
| Grant date | Oct 4, 2016 |
| Priority date | — |
| Expiry date | Apr 15, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F2438/01
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A film layer comprising a high-chi (χ) block copolymer for self-assembly and a surface active polymer (SAP) was prepared on a substrate surface that was neutral wetting to the domains of the self-assembled block copolymer. The block copolymer comprises at least one polycarbonate block and at least one other block (e.g., a styrene-based block). The SAP comprises a hydrophobic fluorinated first repeat unit and a non-fluorinated second repeat unit bearing at least one pendent OH group present as an alcohol or acid (e.g., carboxylic acid). The film layer, whose top surface has contact with an atmosphere, self-assembles to form a lamellar or cylindrical domain pattern having perpendicular orientation with respect to the underlying surface. Other morphologies (e.g., islands and holes of height 1.0Lo) were obtained with films lacking the SAP. The SAP is preferentially miscible with, and lowers the surface energy of, the domain comprising the polycarbonate block.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.