Polymer composition, photoresist comprising the polymer composition, and coated article comprising the photoresist
US9459533B2 · kind B2 · utility
1Cited by
4References
10Claims
0Family size
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Key dates
| Filing date | Jun 25, 2013 |
| Grant date | Oct 4, 2016 |
| Priority date | — |
| Expiry date | Sep 12, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0046
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A copolymer comprises the polymerized product of a dissolution-rate controlling monomer having the formula (I), an acyclic vinyl ether monomer of the formula (II), and a cyclic vinyl ether monomer of the formula (III):wherein Ra, Rb, Rc, L, X, and Z1 are defined herein. A photoresist composition comprising the copolymer is described, as is an article coated with the photoresist composition, and a method of forming an electronic device using the photoresist composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.