Matthew M. Meyer
3Patents
1h-index
8Co-inventors
30Inventor score
Filing activity: Dec 31, 2011 → Feb 27, 2014
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9298093B2 | Polymers, photoresist compositions and methods of forming photolithographic patterns | Physics | 1 | Active |
| US9459533B2 | Polymer composition, photoresist comprising the polymer composition, and coated article comprising the photoresist | Physics | 1 | Active |
| US9382176B2 | Process for the production of chlorinated propenes | Emerging Cross-Sectional Technologies | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.