Patent · US Active

Lithography apparatus and method for producing a mirror arrangement

US9459538B2 · kind B2 · utility

0Cited by

2References

26Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Dirk Schaffer · Jena, DE
Wilfried Clauss · Lörrach, DE
Hin Yiu Anthony Chung · Blaustein, DE

Key dates

Filing date	Nov 6, 2014
Grant date	Oct 4, 2016
Priority date	—
Expiry date	Nov 6, 2034

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70825
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A lithography apparatus is disclosed, having at least one mirror arrangement which includes a mirror substrate including a front side with a reflecting surface, a side wall, which extends along a circumference of the mirror substrate from a rear side of the mirror substrate, and mounting elements to mount the mirror arrangement on a structural element of the lithography apparatus. The rear side of the mirror substrate and an inner side of the side wall delimit a cavity. Each of the mounting elements is connected to the mirror arrangement at a connection surface. The relation S/D>0.5 is satisfied at least one of the connection surfaces, wherein D denotes a thickness of the side wall at the connection surface and S denotes the length of the shortest path through the mirror material from the centroid of the connection surface to the rear side of the mirror substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.